[{"data": {"name": "Effects of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1.MU.m and Below.", "@type": "ScholarlyArticle", "genre": "journal-article", "author": [{"name": "Toshiyuki Yoshimura", "@type": "Person"}, {"name": "Jiro Yamamoto", "@type": "Person"}, {"name": "Hiroshi Shiraishi", "@type": "Person"}, {"name": "Shou-ichi Uchino", "@type": "Person"}, {"name": "Tsuneo Terasawa", "@type": "Person"}, {"name": "Fumio Mural", "@type": "Person"}, {"name": "Shinji Okazaki", "@type": "Person"}], "@context": "http://schema.org/", "encoding": [{"@type": "MediaObject", "contentUrl": "https://www.jstage.jst.go.jp/article/photopolymer1988/10/4/10_4_629/_pdf", "encodingFormat": "application/pdf"}], "publisher": {"name": "Technical Association of Photopolymers, Japan", "@type": "Organization"}, "identifier": [{"@type": "PropertyValue", "value": "10.2494/photopolymer.10.629", "propertyID": "DOI"}, {"@type": "PropertyValue", "value": "CCFHydVKsY4mJ-CTgJwhcorvXiU-CDGDegMDGN8sq-CRKsD5inM84xP", "propertyID": "ISCC"}], "datePublished": "1997-01-01"}, "schema": "schema.org", "mediatype": "application/ld+json"}]