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Core Data

28C7B6ZwEnRUB
ISCC-ID - digital asset identifier
CCETHSSScZjTH-CTHunxk3td6Pt-CDWuCzGDSqycR-CRcydBDeVUeLf
ISCC-CODE - digital asset descriptor
2QTa5N4aeSrCB2MLoPdPF4AsTjstJgcLTnd
PUBLIC-KEY or WALLET-ADDRESS of DECLARING PARTY
0
Number of times updated

Seed Metadata (Immutable)

study of bilevel resist system with conductive bottom layer for eb lithography

Ledger Reference

coblo
Source Ledger/Blockchain
12402781
N-th ISCC Decleration on source ledger
5a9d64f243c5e14ca3a0c28fef115390c60656c04b23d105c4f9559ad8d16adb
Hash of block that includes the ISCC-DECLARATION
770227e7c7db5b38104b9f86a0d2b3f9c943d44c3b0729879f819537dbeae6a6
Hash of transaction that includes the ISCC-DECLERATION
0
Output index that includes ISCC-DECLERATION (UTXO based chains)

Mutable Metadata

[{"data": {"name": "Study of Bi-level Resist System with Conductive Bottom Layer for EB lithography.", "@type": "ScholarlyArticle", "genre": "journal-article", "author": [{"name": "Keiji Watanabe", "@type": "Person"}, {"name": "Miwa Igarashi", "@type": "Person"}, {"name": "Ei Yano", "@type": "Person"}, {"name": "Eiichi Hoshino", "@type": "Person"}, {"name": "Kotaro Shirabe", "@type": "Person"}, {"name": "Masafumi Nakaishi", "@type": "Person"}], "@context": "http://schema.org/", "encoding": [{"@type": "MediaObject", "contentUrl": "https://www.jstage.jst.go.jp/article/photopolymer1988/9/4/9_4_697/_pdf", "encodingFormat": "application/pdf"}], "publisher": {"name": "Technical Association of Photopolymers, Japan", "@type": "Organization"}, "identifier": [{"@type": "PropertyValue", "value": "10.2494/photopolymer.9.697", "propertyID": "DOI"}, {"@type": "PropertyValue", "value": "CCETHSSScZjTH-CTHunxk3td6Pt-CDWuCzGDSqycR-CRcydBDeVUeLf", "propertyID": "ISCC"}], "datePublished": "1996-01-01"}, "schema": "schema.org", "mediatype": "application/ld+json"}]
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